DocumentCode :
2206890
Title :
Investigations On The High-Temperature Performance Of Sputter-Deposited Aluminium Oxide Thin Films
Author :
Fricke, Soeren ; Friedberger, Alois ; Mueller, Gerhard ; Seidel, Helmut ; Schmid, Ulrich
Author_Institution :
Saarland Univ., Saarbruecken
fYear :
2007
fDate :
28-31 Oct. 2007
Firstpage :
764
Lastpage :
767
Abstract :
Aluminum oxide thin films are deposited by reactive DC magnetron sputtering onto silicon substrates. In post deposition annealing steps the films are heat treated up to 1000degC. The films are analyzed applying electrical and micro-structural characterization to achieve a comprehensive understanding on film properties. Their potential as insulating films in high temperature sensor applications is evaluated.
Keywords :
aluminium compounds; insulating thin films; rapid thermal annealing; silicon; sputter deposition; Al2O3-Si; electrical characterization; heat treatment; high temperature sensor; high-temperature performance; insulating films; micro-structural characterization; post deposition annealing; reactive DC magnetron sputtering; thin films; Aluminum oxide; Annealing; Plasma applications; Plasma temperature; Semiconductor thin films; Silicon; Sputtering; Substrates; Testing; Thin film sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2007 IEEE
Conference_Location :
Atlanta, GA
ISSN :
1930-0395
Print_ISBN :
978-1-4244-1261-7
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2007.4388512
Filename :
4388512
Link To Document :
بازگشت