• DocumentCode
    2206890
  • Title

    Investigations On The High-Temperature Performance Of Sputter-Deposited Aluminium Oxide Thin Films

  • Author

    Fricke, Soeren ; Friedberger, Alois ; Mueller, Gerhard ; Seidel, Helmut ; Schmid, Ulrich

  • Author_Institution
    Saarland Univ., Saarbruecken
  • fYear
    2007
  • fDate
    28-31 Oct. 2007
  • Firstpage
    764
  • Lastpage
    767
  • Abstract
    Aluminum oxide thin films are deposited by reactive DC magnetron sputtering onto silicon substrates. In post deposition annealing steps the films are heat treated up to 1000degC. The films are analyzed applying electrical and micro-structural characterization to achieve a comprehensive understanding on film properties. Their potential as insulating films in high temperature sensor applications is evaluated.
  • Keywords
    aluminium compounds; insulating thin films; rapid thermal annealing; silicon; sputter deposition; Al2O3-Si; electrical characterization; heat treatment; high temperature sensor; high-temperature performance; insulating films; micro-structural characterization; post deposition annealing; reactive DC magnetron sputtering; thin films; Aluminum oxide; Annealing; Plasma applications; Plasma temperature; Semiconductor thin films; Silicon; Sputtering; Substrates; Testing; Thin film sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2007 IEEE
  • Conference_Location
    Atlanta, GA
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-1261-7
  • Electronic_ISBN
    1930-0395
  • Type

    conf

  • DOI
    10.1109/ICSENS.2007.4388512
  • Filename
    4388512
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2206890