DocumentCode :
2207197
Title :
Low pressure pulse-modulated and radio-frequency plasma for CF4 decomposition
Author :
Kuroki, Tomoyuki ; Tanaka, Shingo ; Okubo, Masaaki ; Yamamoto, Toshiaki
Author_Institution :
Dept. of Mech. Eng., Osaka Prefecture Univ., Japan
Volume :
4
fYear :
2005
fDate :
2-6 Oct. 2005
Firstpage :
2900
Abstract :
The CF4 is one of the most stable gases among perfluorocarbons (PFCs) and their decomposition is extremely difficult. In this study, the CF4 decomposition was investigated using the pulse-modulated and radio-frequency (RF) plasma of 2 MHz, which is applicable for plasma etching and novel functional material manufacturing processes. When the absolute pressure, the flow rates of 100 % CF4 and 99.5 % O2 were set at 80 Pa, 0.1 and 0.2 NL/min, respectively, almost complete CF4 decomposition was achieved at the range of 25 kHz to 99 kHz of the pulse modulation frequency. The byproduct analysis in CF4 decomposition was carried out using a CO2 gas analyzer and a Fourier transform infrared spectrophotometer (FTIR) when the pulse modulation frequency was set at 75 kHz. It was known that 10%, 50% and 24% of CF4 were converted to CO, CO2 and COF2, respectively. It was considered that the remaining 16% of carbon was converted to carbon particle or other organic substances.
Keywords :
Fourier transforms; carbon compounds; decomposition; infrared spectrometers; organic compounds; plasma materials processing; pulse modulation; spectrophotometers; sputter etching; CF4; CF4 decomposition; CO2; Fourier transform infrared spectrophotometer; O2; byproduct analysis; carbon particle; gas analyzer; inductively coupled plasma; material manufacturing process; perfluorocarbons; plasma etching; pulse modulation frequency; pulse-modulated plasma; radio-frequency plasma; stable gases; Etching; Fourier transforms; Gases; Infrared spectra; Manufacturing processes; Plasma applications; Plasma materials processing; Plasma stability; Pulse modulation; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 2005. Fourtieth IAS Annual Meeting. Conference Record of the 2005
ISSN :
0197-2618
Print_ISBN :
0-7803-9208-6
Type :
conf
DOI :
10.1109/IAS.2005.1518871
Filename :
1518871
Link To Document :
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