• DocumentCode
    2207539
  • Title

    Simulation study of high power microwave generation by virtual cathode oscillation in coaxial vircator

  • Author

    Jung, Y. ; Choi, M.C. ; Song, K.B. ; Sung, G.Y. ; Choi, E.H.

  • Author_Institution
    Charged Particle Beam & Plasma Lab, Kwangwoon Univ., Seoul, South Korea
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    181
  • Abstract
    Summary form only given, as follows. We have numerically simulated the high power microwave generation by virtual cathode oscillation in a coaxial vircator with 3 dimensional PIC code Magic. It is noted that the coaxial vircator has the advantage of an enhancement of power efficiency and gaining of narrow bandwidth frequency. The study is focused on the design of a diode structure for a coaxial vircator suitable for Chundoong IREB pulser (Max. 600 kV, 85 kA, 60 ns). It consists of a center annular cathode, a cylindrical meshed-anode and a reflector. The simulation results showed that the coaxial vircator can indeed be operated at the selected frequency with the narrow bandwidth and the microwave output power strongly depends on the position and geometry of the reflector. From this simulation results we expect that the maximum microwave output power will be obtained by the reflector of 4 cm in width and also 4 cm in distance away from the IREB, where the resonant frequency of microwave from coaxial vircator is simulated to be 6.577 GHz.
  • Keywords
    finite difference time-domain analysis; microwave generation; relativistic electron beam tubes; vircators; 3D PIC code; 6.577 GHz; 600 kV; 85 kA; IREB pulser; center annular cathode; coaxial vircator; cylindrical meshed-anode; high power microwave generation; maximum microwave output power; narrow bandwidth frequency; power efficiency; simulation; virtual cathode oscillation; Bandwidth; Cathodes; Coaxial components; Diodes; Frequency; Geometry; High power microwave generation; Numerical simulation; Power generation; Solid modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030398
  • Filename
    1030398