• DocumentCode
    2207699
  • Title

    Calculation of ion energy distributions from RF plasmas using a simplified kinetic model

  • Author

    Misakian, M. ; Wang, Y.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    182
  • Abstract
    Summary form only given. Using an elementary kinetic approach, a procedure has been developed for calculating ion energy distributions (IEDs) from radio frequency Q plasmas. The calculated distributions, which are in the form of histograms, are used to fit experimental argon and CF/sub 3/ IEDs measured in a gaseous electronics conference rf reactor modified to operate in a pulsed inductively coupled mode. Given the average plasma potential profile and its time dependence, the calculation incorporates a number of parameters used in more comprehensive treatments of the problem to determine the shape of the IED. The reverse calculation that determines the average potential profile, given an experimental IED, cannot be uniquely done, but some insights may be gained in some cases if a sufficient number of plasma related parameters are known, e.g., the shape and amplitude of the rf modulation.
  • Keywords
    plasma kinetic theory; Ar; RF modulation; RF plasmas; elementary kinetic approach; gaseous electronics conference RF reactor; ion energy distributions; plasma potential profile; potential profile; pulsed inductively coupled mode; radio frequency Q plasmas; simplified kinetic model; time dependence; trifluoromethyl cation; Electrons; Helium; Kinetic theory; Plasma density; Plasma materials processing; Plasma measurements; Radio frequency; Shape; Spectroscopy; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854967
  • Filename
    854967