DocumentCode
2208200
Title
Spatial and time resolved investigations of NO- and OH-distributions in dielectric barrier discharge plasmas using planar laser induced fluorescence
Author
Kleinhans, R. ; Tiase, L. ; Beushausen, V.
Author_Institution
Laser-Lab. Gottingen e.V., Germany
fYear
2000
fDate
4-7 June 2000
Firstpage
191
Abstract
Summary form only given. The development of lean combustion technology calls for new systems in exhaust gas after treatment since state-of-the-art catalysts do not work properly in oxygen rich environments. The potential of plasma based processes has been investigated by several research groups. It turned out that the plasma induced reaction kinetic is extremely complex. Therefore empirical process optimization by varying electrical and geometrical parameters of the experimental setup is not very efficient. Only the knowledge of the fundamental chemical reactions promises specific improvements in plasma exhaust after treatment. Optical laser aided methods offer non-intrusive investigations of the complex reactions in the plasma filaments. In this work laser spectroscopic measurements have been applied to plasma filaments of pulsed dielectric barrier discharges. The spatial and time resolved distributions of the important radicals NO and OH are obtained by using planar laser induced fluorescence (PLIF).
Keywords
combustion; discharges (electric); fluorescence; plasma chemistry; plasma diagnostics; reaction kinetics; NO-distributions; O rich environments; OH-distributions; catalysts; chemical reactions; complex reactions; dielectric barrier discharge plasmas; electrical parameters; empirical process optimization; exhaust gas; geometrical parameters; laser spectroscopic measurements; lean combustion technology; nonintrusive investigations; optical laser aided methods; planar laser induced fluorescence; plasma based processes; plasma exhaust; plasma filaments; plasma induced reaction kinetics; spatial resolved investigations; time resolved investigations; Chemical lasers; Combustion; Electrochemical impedance spectroscopy; Geometrical optics; Kinetic theory; Plasma chemistry; Plasma measurements; Pulse measurements; Spatial resolution; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854987
Filename
854987
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