• DocumentCode
    2208311
  • Title

    Pulsed ICP plasma generation and characterization

  • Author

    Wei Guo ; DeJoseph, C.A.

  • Author_Institution
    Innovative Sci. Solutions Inc., Dayton, OH, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    193
  • Abstract
    Summary form only given, as follows. Modulated rf power at 13.56 MHz has been applied to a planar coil to generate pulsed, low pressure, inductively coupled argon plasmas (ICP). The modulation is realized by applying a rectangular window function in time to the output of a rf generator, with modulation frequencies between 100 Hz and 30 kHz and duty cycles between 10% and 90%. Current and voltage measurements at the coil are used to measure the peak power. A scanning Langmuir probe and a heterodyne microwave interferometer are used to measure plasma density during the pulse. In addition to these diagnostics, a miniature fiber-optic spectrometer is used to spectrally characterize the light output from the plasma, and a photo multiplier tube with narrow band filters is used to monitor the time dependence of the plasma emission. As expected, much higher peak plasma densities can be produced without damaging the rf window. Also, a reduced surface charging effect has been observed by performing Langmuir probe measurements on the plasma body. Due to the non-linearity of the plasma impedance, excessive rf power reflections and harmonic components of the fundamental rf frequency (13.56 MHz) exist between the ICP antenna and the rf generator that in turn complicate rf power measurements. The results of the experiment and the solutions to the problems encountered in the experiment will be presented.
  • Keywords
    Langmuir probes; plasma density; plasma diagnostics; plasma production; radiowave interferometry; 13.56 MHz; Ar; RF generator; current measurements; excessive RF power reflections; fundamental RF frequency; harmonic components; heterodyne microwave interferometer; light output; miniature fiber-optic spectrometer; modulated RF power; narrow band filters; photo multiplier tube; planar coil; plasma density; plasma emission; plasma impedance; pulsed ICP plasma generation; pulsed low pressure inductively coupled Ar plasmas; rectangular window function; scanning Langmuir probe; surface charging effect; voltage measurements; Character generation; Coils; Frequency; Plasma density; Plasma measurements; Power generation; Power measurement; Probes; Pulse generation; Pulse modulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854991
  • Filename
    854991