• DocumentCode
    2208815
  • Title

    Gas discharges induced by a high-power and short-pulse microwave

  • Author

    Onoi, M. ; Azuma, K. ; Fujiwara, E. ; Yatsuzuka, M.

  • Author_Institution
    Dept. of Electr. Eng., Himeji Inst. of Technol., Hyogo, Japan
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    205
  • Abstract
    Summary form only given. High power microwave (HPM) with the peak power of 20 MW, pulse width of 14 ns and frequency of 13 GHz generated by a virtual cathode oscillator was irradiated uniformly into a gap with a DC voltage less than the gap-breakdown voltage. The gap consists of two spherical stainless electrodes of 4.1 cm in a diameter. The gap distance is 15 mm. The air pressure was varied from 50 to 760 Torr. Gas discharge luminescence was observed with a high-speed image converter camera. The time history of the applied voltage, the discharge current and the microwave was observed with a digital oscilloscope.
  • Keywords
    electrodes; high-frequency discharges; image convertors; luminescence; plasma diagnostics; plasma pressure; vircators; 13 GHz; 14 ns; 15 mm; 20 mW; 4.1 cm; 50 to 760 torr; DC voltage; air pressure; applied voltage; digital oscilloscope; discharge current; frequency; gap; gap distance; gap-breakdown voltage; gas discharge luminescence; gas discharges; high-power microwaves; high-speed image converter camera; microwave; peak power; pulse width; short-pulse microwaves; spherical stainless electrodes; time history; virtual cathode oscillator; Cathodes; DC generators; Discharges; Frequency; High power microwave generation; Microwave generation; Power generation; Pulse generation; Space vector pulse width modulation; Voltage-controlled oscillators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.855013
  • Filename
    855013