Vacuum arc electron source for pre-ionizing Z-pinch gas loads

Author

Binder, R. ; Niansheng Qi ; Prasad, R.R. ; Schein, J. ; McFarland, M. ; Krishnan, M. ; Yushkov, A. ; Yushkov, G.

Author_Institution

Almeda Appl. Sci. Corp., San Leandro, CA, USA

fYear

2000

fDate

4-7 June 2000

Firstpage

216

Abstract

Summary form only given. We report the development of a new type of intense electron source based on vacuum arc technology. The primary application of this source is to pre-ionize gas jets used as z-pinch loads. We have designed and fabricated a 1 kA, 10 kV, 6 cm diameter electron source. The source will be used to ionize a gas puff. Using our 2-color, 8-channel fiber optic interferometer, the gas and the electron density profiles are measured and the ratios of the neutral to the electron densities are determined. Details of the electron source will be reported.

Keywords

Z pinch; electron sources; fusion reactor ignition; ionisation; light interferometry; plasma diagnostics; plasma jets; vacuum arcs; 1 kA; 10 kV; 2-color 8-channel fiber optic interferometer; X-ray yield; Z-pinch gas loads; electron density profiles; electron source; gas density profiles; gas puff; initial imploding plasma conditions; pre-ionization; vacuum arc electron source; Acoustic beams; Acoustic measurements; Electron sources; Instruments; Optical design; Optical fibers; Optical interferometry; Plasma measurements; Structural beams; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on

Conference_Location

New Orleans, LA, USA

ISSN

0730-9244

Print_ISBN

0-7803-5982-8

Type

conf

DOI

10.1109/PLASMA.2000.855035

Filename

855035