DocumentCode
2209634
Title
Future of plasma treatment of wastes
Author
Plodinec, M.J.
Author_Institution
Mississippi State Univ., MS, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
224
Abstract
Summary form only given. In the last three or four decades, then has been a growing awareness of the potentially devastating effects of toxic wastes (both chemically hazardous and radioactive) on the environment. This is particularly true in the highly industrialized countries. These toxic wastes may be derived from industrial process streams, sewage and trash (generally chemically hazardous waste), or from nuclear power production or production of nuclear materials for defence purposes (radioactive waste). Two types of plasma systems have been extensively examined for waste treatment: plasma arc and plasma torch systems. Use of a plasma torch to achieve temperatures hot enough to treat waste materials is a relatively new concept. Although extensively studied in the US by the Department of Energy, plasma torch systems have not seen significant use for radioactive wastes. However, plasma torch systems are being used for treatment of waste streams in other countries, particularly in Japan.
Keywords
arcs (electric); plasma applications; plasma materials processing; plasma torches; radioactive waste disposal; waste disposal; chemically hazardous waste; defence purposes; environment; highly industrialized countries; industrial process streams; nuclear materials; nuclear power production; plasma arc system; plasma torch systems; plasma treatment; radioactive waste; sewage; toxic wastes; trash; waste treatment; wastes; Chemical hazards; Chemical industry; Chemical processes; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Production; Toxic chemicals; Waste materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.855049
Filename
855049
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