Title :
Fabrication of a two-dimensional photonic crystals using reactive ion etching
Author :
Zhou, Jingtao ; Shen, Huajun ; Zhang, Huihui ; Liu, Xinyu
Author_Institution :
Inst. of Microelectron., Chinese Acad. of Sci., Beijing, China
Abstract :
A triangular lattice photonic crystals with lattice constant 500 nm and the diameter 300 nm of air pores in the silicon-on-insulator (SOI) substrate have been designed, fabricated and realized. The processes of the fabrication of the two-dimensional photonic crystals based on SOI, including masking, electron-beam lithography, and reactive ion etching are introduced.
Keywords :
electron beam lithography; masks; photonic crystals; silicon-on-insulator; sputter etching; electron-beam lithography; masking; reactive ion etching; silicon-on-insulator substrate; size 300 nm; two-dimensional photonic crystals; Electron beams; Etching; Fabrication; Frequency; Lattices; Lithography; Photonic band gap; Photonic crystals; Silicon on insulator technology; Tellurium; fabrication; photonic crystals; silicon etching; style;
Conference_Titel :
Communication Systems, 2008. ICCS 2008. 11th IEEE Singapore International Conference on
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-2423-8
Electronic_ISBN :
978-1-4244-2424-5
DOI :
10.1109/ICCS.2008.4737379
