DocumentCode :
2210430
Title :
Considerations on oxide reliability QC
Author :
Katto, Hisao
Author_Institution :
Device Development Center, Hitachi, Ltd.
fYear :
1993
fDate :
24-27 Oct 1993
Firstpage :
52
Lastpage :
58
Keywords :
Acceleration; Dielectric breakdown; Dielectric measurements; Failure analysis; Laboratories; Power engineering and energy; Quality assurance; Reliability engineering; Semiconductor device modeling; Weibull distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 1993 International
Type :
conf
DOI :
10.1109/IRWS.1993.666292
Filename :
666292
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2210430
بازگشت