• DocumentCode
    2210721
  • Title

    Rod-pinch studies on a 1-2 MV, 30 /spl Omega/, 40-50 ns generator at PEM

  • Author

    Vermare, C. ; Delvaux, Jeroen ; Horde, Y. ; Merle, E. ; Nicolas, R. ; Nore, D. ; Rosol, Rodolphe ; Veron, L.

  • Author_Institution
    CEA-DAM, Pontfaverger-Moronvilliers, France
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    249
  • Abstract
    Summary form only given, as follows. The CEA-DAM is interested by rod-pinch diode geometry to radiography future dynamic experiment. Even if those diodes should work at any applied voltage, previous experiments reported a too low efficiency grow rate versus voltage. A collaboration with CEG and Sandia to a 6 MV experiment on the ASTERIX generator will permit to evaluate the rod-pinch potential at higher voltage. Above /spl sim/4 MV, others diodes geometries seem more attractive. Anyway, Rod-Pinch diodes operated from 1 to 4 MV have shown their ability to produce bright submillimeter X-ray spots. Studies on a 1-2 MV, 30 Q, 40-50 ns generator were started at the end of 2001 by the PEM research group. We present on this paper the first results obtained on the 1-2 MV range at PEM. After the generator polarity was changed, a effort has been made on electrical diagnostics and the evaluation of the diode impedance. In order to follow the diode functioning during the pulse, we develop a time resolved X ray imaging system. So, the migration of the electron from the gap area to the rod end is compared to LSP simulations. Exotic A-K schemes will be tested.
  • Keywords
    pinch effect; plasma diagnostics; plasma diodes; 1 to 2 MV; ASTERIX generator; CEA-DAM; PEM; diode impedance; electrical diagnostics; generator polarity; rod-pinch diode; submillimeter X-ray spots; time resolved X ray imaging system; Anodes; Diodes; Electron beams; Laboratories; Physics; Plasma measurements; Plasma simulation; Plasma sources; Plasma x-ray sources; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030520
  • Filename
    1030520