DocumentCode
2210912
Title
Implementation of In-Line TDDB Testing for Gate Oxide Reliability Improvement
Author
Aldridge, Bruce ; Zeglinski, David ; Vadipour, Mostafa
Author_Institution
Western Digital Corporation
fYear
1993
fDate
24-27 Oct 1993
Firstpage
68
Lastpage
78
Keywords
CMOS technology; Capacitors; Dielectrics; Electric breakdown; Failure analysis; Manufacturing; Measurement standards; Monitoring; Production control; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 1993 International
Type
conf
DOI
10.1109/IRWS.1993.666294
Filename
666294
Link To Document