DocumentCode :
2211222
Title :
Optical analysis of haze ratio and antireflection in structured thin film solar cell
Author :
Chao, C.C. ; Pan, Y.C. ; Wang, C.M. ; Chang, J.Y.
Author_Institution :
Dept. of Opt. & Photonics, Nat. Central Univ., Jhongli, Taiwan
fYear :
2010
fDate :
11-13 Aug. 2010
Firstpage :
56
Lastpage :
60
Abstract :
In this paper, the influence of the haze ratio and antireflection properties of the thin film solar cell with a periodic texture is theoretical investigated. Two different cases, Case 1 and Case 2, are compared. Case 1 shows an extremely high haze ratio of 97.4% while Case 2 shows a low reflectance of 0.3%. For the thickness of the a-Si:H layer is 100nm~400nm, the JSC of the antireflection case is higher than that of high haze ratio one. Until the thickness of the a-Si:H layer is increased to 500nm, the JSC of Case 1 is 20.5 mA/cm2 which is higher than Case 2.
Keywords :
antireflection coatings; periodic structures; solar cells; a-Si:H layer; antireflection properties; haze ratio; optical analysis; periodic texture; structured thin film solar cell; Gratings; Indium tin oxide; Optical films; Optical reflection; Photovoltaic cells; Reflectivity; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Electromagnetism and Student Innovation Competition Awards (AEM2C), 2010 International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-6416-6
Type :
conf
DOI :
10.1109/AEM2C.2010.5578788
Filename :
5578788
Link To Document :
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