DocumentCode
2211502
Title
Solid state pulsed power systems for plasma applications
Author
Gaudreau, M.P.J. ; Casey, J. Alec ; Mulvaney, J.M. ; Kempkes, M.A. ; Hawkey, T.J.
Author_Institution
Diversified Technol. Inc., Bedford, MA, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
265
Abstract
Summary form only given. Diversified Technologies, Inc. (DTI) has developed and patented solid state technology to provide fast, high power opening and closing switches. These switches are modular, and can be combined in series and/or in parallel to provide a wide range of voltage, current, and power handling capabilities. To date, DTI has built solid state, hard switch pulsed power systems with at 1 kV to 160 kV, and peak power levels up to 70 MW, and capable of pulse frequencies from DC to 400 kHz. Initial applications of this capability have been for providing repetitive pulses of electrical power for RF amplifier systems (klystrons, TWTs, and gyrotrons) and for plasma processing. This paper describes the basic design and performance of these solid state modulators. Specific focus is placed on application of this pulsed power technology to plasma processes, such as plasma immersion ion implantation (PIII) for both semiconductors and metal treatment. Examples of specific system applications include the use of DTI modulators for high volume diamond-like coating (DLC) and plasma source ion implantation (PSII) processes in metal processing, and high voltage, high peak power(100 kV, 500 A) modulators for semiconductor process research and operations.
Keywords
gyrotrons; ion implantation; klystrons; microwave power amplifiers; plasma applications; pulsed power switches; travelling wave amplifiers; 1 to 160 kV; 500 A; 70 MW; TWT; closing switches; gyrotrons; hard switch pulsed power systems; high volume diamond-like coating; klystrons; opening switches; plasma applications; plasma immersion ion implantation; plasma processing; plasma source ion implantation; pulsed power technology; semiconductor process operations; semiconductor process research; solid state pulsed power systems; solid state technology; Diffusion tensor imaging; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Pulse amplifiers; Pulse power systems; Solid state circuits; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.855122
Filename
855122
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