DocumentCode :
2212223
Title :
Finite Ground Coplanar Lines on CMOS Grade Silicon with a Thick Embedded Silicon Oxide Layer Using Micromachining Techniques
Author :
Wang, Guoan ; Bacon, Andrew ; Abdolvand, Reza ; Ayazi, Farrokh ; Papapolymerou, John ; Tentzeris, Emmanouil M.
Author_Institution :
School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0250, USA
fYear :
2003
fDate :
Oct. 2003
Firstpage :
25
Lastpage :
27
Abstract :
Finite Ground Coplanar (FGC) waveguide transmission lines on CMOS grade silicon wafer (¿<0.01 ohm-cm) with a thick embedded silicon oxide layer have been developed using micromachining techniques. Lines with different lengths were designed, fabricated and measured. Measured attenuation and s-parameters are presented in the paper. Results show that the attenuation loss of the fabricated FGC lines is as low as 3.2 dB/cm at 40 GHz.
Keywords :
Attenuation; Circuits; Coplanar transmission lines; Coplanar waveguides; Costs; Dielectric substrates; Electromagnetic waveguides; Micromachining; Polyimides; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2003 33rd European
Conference_Location :
Munich, Germany
Print_ISBN :
1-58053-834-7
Type :
conf
DOI :
10.1109/EUMA.2003.340817
Filename :
4142945
Link To Document :
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