• DocumentCode
    2212223
  • Title

    Finite Ground Coplanar Lines on CMOS Grade Silicon with a Thick Embedded Silicon Oxide Layer Using Micromachining Techniques

  • Author

    Wang, Guoan ; Bacon, Andrew ; Abdolvand, Reza ; Ayazi, Farrokh ; Papapolymerou, John ; Tentzeris, Emmanouil M.

  • Author_Institution
    School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0250, USA
  • fYear
    2003
  • fDate
    Oct. 2003
  • Firstpage
    25
  • Lastpage
    27
  • Abstract
    Finite Ground Coplanar (FGC) waveguide transmission lines on CMOS grade silicon wafer (¿<0.01 ohm-cm) with a thick embedded silicon oxide layer have been developed using micromachining techniques. Lines with different lengths were designed, fabricated and measured. Measured attenuation and s-parameters are presented in the paper. Results show that the attenuation loss of the fabricated FGC lines is as low as 3.2 dB/cm at 40 GHz.
  • Keywords
    Attenuation; Circuits; Coplanar transmission lines; Coplanar waveguides; Costs; Dielectric substrates; Electromagnetic waveguides; Micromachining; Polyimides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2003 33rd European
  • Conference_Location
    Munich, Germany
  • Print_ISBN
    1-58053-834-7
  • Type

    conf

  • DOI
    10.1109/EUMA.2003.340817
  • Filename
    4142945
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2212223