DocumentCode
2212335
Title
Development dynamics of the 2-D vortex structures in high-current plasma lens
Author
Goncharov, A. ; Kirichenko, G. ; Litovko, I.
Author_Institution
Inst. of Nucl. Res., Acad. of Sci., Kiev, Ukraine
fYear
2000
fDate
4-7 June 2000
Firstpage
280
Abstract
Summary form only given. In this paper we are consider plasma lens (PL) hydrodynamic instability in the nonlinear approximation. It is shown that ion-electron instability in the high-current PL caused by the radial gradient of the magnetic field axial component can lead to the creation of electron vortices. The nonlinear differential equation for the electrical potential has been obtained. One described a drift motion of the electrons in oscillating electrical fields of the high-current PL. Questions of appearance and dynamics of vortex structures are discussed on the basis of computer models. It is shown that some vortices are created under azimuthal perturbation of the equilibrium potential. Vortex merger processes led to a single stable large vortex which moves azimuthally. Estimations for drift velocity, spin rate, maximum potential of vortex have been made.
Keywords
plasma devices; plasma flow; plasma instability; plasma nonlinear processes; plasma-beam interactions; vortices; 2D vortex structures; H-field strength lines equipotentialization; computer models; development dynamics; drift velocity; electrical potential; electron vortices; electrons drift motion; equilibrium potential azimuthal perturbation; focused ion beam; high-current plasma lens; hydrodynamic instability; ion-electron instability; magnetic field axial component; momentum aberrations; nonlinear approximation; nonlinear differential equation; oscillating electrical fields; plasmaoptics; radial gradient; space electrostatic fields; spherical aberrations; vortex merger processes; vortex structures; Chemical compounds; Distribution functions; Ion beams; Mass spectroscopy; Plasma chemistry; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Process control;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.855157
Filename
855157
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