• DocumentCode
    2212335
  • Title

    Development dynamics of the 2-D vortex structures in high-current plasma lens

  • Author

    Goncharov, A. ; Kirichenko, G. ; Litovko, I.

  • Author_Institution
    Inst. of Nucl. Res., Acad. of Sci., Kiev, Ukraine
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    280
  • Abstract
    Summary form only given. In this paper we are consider plasma lens (PL) hydrodynamic instability in the nonlinear approximation. It is shown that ion-electron instability in the high-current PL caused by the radial gradient of the magnetic field axial component can lead to the creation of electron vortices. The nonlinear differential equation for the electrical potential has been obtained. One described a drift motion of the electrons in oscillating electrical fields of the high-current PL. Questions of appearance and dynamics of vortex structures are discussed on the basis of computer models. It is shown that some vortices are created under azimuthal perturbation of the equilibrium potential. Vortex merger processes led to a single stable large vortex which moves azimuthally. Estimations for drift velocity, spin rate, maximum potential of vortex have been made.
  • Keywords
    plasma devices; plasma flow; plasma instability; plasma nonlinear processes; plasma-beam interactions; vortices; 2D vortex structures; H-field strength lines equipotentialization; computer models; development dynamics; drift velocity; electrical potential; electron vortices; electrons drift motion; equilibrium potential azimuthal perturbation; focused ion beam; high-current plasma lens; hydrodynamic instability; ion-electron instability; magnetic field axial component; momentum aberrations; nonlinear approximation; nonlinear differential equation; oscillating electrical fields; plasmaoptics; radial gradient; space electrostatic fields; spherical aberrations; vortex merger processes; vortex structures; Chemical compounds; Distribution functions; Ion beams; Mass spectroscopy; Plasma chemistry; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Process control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.855157
  • Filename
    855157