• DocumentCode
    2212390
  • Title

    Nano-scale phase separation in As2S3 film and its effect on scattering loss in plasma etched waveguides

  • Author

    Choi, Duk Yong ; Madden, Steve ; Rode, Andrei ; Wang, Rongping ; Ankiewicz, Adrian ; Luther-Davies, Barry

  • Author_Institution
    Australian Nat. Univ., Canberra
  • Volume
    1
  • fYear
    2006
  • fDate
    22-25 Oct. 2006
  • Firstpage
    326
  • Lastpage
    327
  • Abstract
    We present evidence for nano-scale phase separation of As2S3 films prepared by ultra-fast pulsed laser deposition and its effect on line edge roughness in plasma etched waveguides. By changing the plasma chemistry from CF4-O2 to CHF3-O2, we demonstrate a two times reduction in roughness.
  • Keywords
    arsenic compounds; phase separation; plasma chemistry; plasma filled waveguides; pulsed laser deposition; sputter etching; line edge roughness; nanoscale phase separation; plasma chemistry; plasma etched waveguides; scattering loss; ultrafast pulsed laser deposition; Atom optics; Bonding; Optical devices; Optical films; Optical losses; Optical scattering; Optical waveguides; Plasma applications; Plasma chemistry; Sputter etching; arsenic tri-sulphide (As2S3); line edge roughness; nano-scale phase separation; plasma etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
  • Conference_Location
    Gyeongju
  • Print_ISBN
    978-1-4244-0541-1
  • Electronic_ISBN
    978-1-4244-0541-1
  • Type

    conf

  • DOI
    10.1109/NMDC.2006.4388750
  • Filename
    4388750
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2212390