Title :
New developments in pulsed power technology and associated electron beam transport mechanisms at the United Kingdom Atomic Weapons Establishment
Author :
Birrell, A.R. ; Edwards, R.D. ; Goldsack, T.J. ; Sinclair, M.A.
Author_Institution :
Dept. of Hydrodynamics, Atomic Weapons Establishment, Reading, UK
Abstract :
Summary form only given. The Pulsed Power Group at AWE is interested in the generation of small, intense, multi-megavolt X-ray sources for radiographic applications. For this paper, research has been carried out into electron beam transport and focusing studies on one of our single pulse forming line flash X-ray machines. Experiments were undertaken on E Minor to improve the radiographic spot size generated by our ´paraxial diode´. This is a novel anode/cathode assembly designed to produce a small diameter electron beam focused onto a high Z target. Electrons are propagated through a gas-filled cone such that their electrostatic repulsive and magnetic attractive forces are almost cancelled. For this paper, research has been undertaken to optimise the paraxial diode to improve its performance in both dose output and radiographic spot size.
Keywords :
X-ray production; optimisation; plasma diodes; power supplies to apparatus; pulsed power technology; radiography; E Minor; Pulsed Power Group; United Kingdom Atomic Weapons Establishment; anode/cathode assembly; dose output; electron beam focusing; electron beam transport; electron beam transport mechanisms; electron propagation; electrostatic repulsive forces; gas-filled cone; high Z target; line flash X-ray machines; magnetic attractive forces; multi-megavolt X-ray sources; optimisation; paraxial diode; pulsed power technology; radiographic applications; radiographic spot size; small diameter electron beam focus; Atomic beams; Atomic measurements; Diodes; Electron beams; Hydrodynamics; Power generation; Pulse generation; Radiography; Stability; Weapons;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.855163