DocumentCode
2213305
Title
Simple selective electron beam patterning on a single nanowire
Author
Kim, Kanghyun ; Kang, Haeyong ; Huh, Jung Hwan ; Kim, Gyu Tae
Author_Institution
Korea Univ., Seoul
Volume
1
fYear
2006
fDate
22-25 Oct. 2006
Firstpage
408
Lastpage
409
Abstract
Newly developed techniques of selective electron beam patterning on a single nanowire are introduced without using the coordinate markers on the substrate or with the help of the optical microscopes. Coordinate-less patterning by image processing under scanning electron microscope was efficient to define electrodes patterns on the 100 nm scale nanowires. And a method using an optical microscope image made it possible not only to create fine electrodes of 10 nm order of nanowires but to reduce the working times and enable the process easier. A proper selective patterning of the electrode on a selected individual nanowire will be quite helpful for the fundamental researches as the bottom-up approach on the different length scale of nanowires.
Keywords
electron beam lithography; nanowires; optical microscopy; scanning electron microscopy; coordinate less patterning; optical microscopes; scanning electron microscope; simple selective electron beam patterning; single nanowire; size 100 nm; Carbon nanotubes; Electrodes; Electron beams; Electron optics; FETs; Lithography; Nanoscale devices; Optical microscopy; Optical sensors; Scanning electron microscopy; electron beam lithography; nanodevice; nanowire;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location
Gyeongju
Print_ISBN
978-1-4244-0541-1
Electronic_ISBN
978-1-4244-0541-1
Type
conf
DOI
10.1109/NMDC.2006.4388790
Filename
4388790
Link To Document