Title :
New microwave plasma sources for large scale applications up to atmospheric pressure
Author :
Emmerich, R. ; Kaiser, Marcus ; Urban, H. ; Graf, M. ; Rauchle, E. ; Elsner, P. ; Feichtinger, Jochen ; Schulz, Alexander ; Walker, M. ; Baumgartner, K.-M. ; Muegge, H.
Abstract :
Summary form only given, as follows. Plasma technology is used in a wide field of applications for example for PECD-deposition, activation and etching. In particular microwave enhanced plasmas are very effective for activation of surfaces. Our objective targets are to construct plasma sources for large area application and plasma sources which can be used in a wide pressure regime as possible up to atmospheric pressure. In this presentation two sources for large area and wide pressure range plasma are discussed. They are based on a coaxial coupling of the magnetron and the antenna.
Keywords :
antennas in plasma; plasma density; plasma focus; plasma materials processing; plasma sources; Duo-Plasmaline; atmospheric pressure; bifocal shape; coaxial coupling of magnetron; focus lines; homogenous microwave plasma; large area application; linear extension; linearly extended microwave antenna; microwave enhanced plasma; microwave plasma sources; plasma arrays; plasma barrel; plasma density; plasma ignition; wide pressure regime; Large-scale systems; Microwave devices; Plasma accelerators; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Plasma waves;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030649