DocumentCode :
2214629
Title :
Body effects in tri-gate bulk FinFETs for DTMOS
Author :
Han, Jin-Woo ; Lee, Choong-Ho ; Park, Donggun ; Choi, Yang-Kyu
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejeon
Volume :
1
fYear :
2006
fDate :
22-25 Oct. 2006
Firstpage :
208
Lastpage :
209
Abstract :
Body factor was investigated in tri-gate bulk FinFET for the first time. Increment of on-state current and decrement of off-state current are achieved by body bias modulation. Electrical measurements were carried out to investigate the body effects in view points of a fin width that governs short-channel effects. A wide fin width was preferable for a dynamic threshold voltage operation and wide range of the threshold adjustment, however, the fin width is limited for suppression of short-channel effects. This work can provide feasibility of DTMOS application of FinFETs for low-power and high-performance application
Keywords :
MOSFET; semiconductor device measurement; semiconductor device testing; DTMOS; body bias modulation; body effects; dynamic threshold voltage; electrical measurements; off-state current; on-state current; short-channel effects; tri-gate bulk FinFET; Computer science; Degradation; Diodes; Electric variables measurement; Fabrication; FinFETs; MOSFET circuits; Research and development; Silicon; Threshold voltage; FinFET; body effects; dynamic threshold voltage; high performance; low power;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location :
Gyeongju
Print_ISBN :
978-1-4244-0540-4
Electronic_ISBN :
978-1-4244-0541-1
Type :
conf
DOI :
10.1109/NMDC.2006.4388842
Filename :
4388842
Link To Document :
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