A new approach to accurate resistivity measurement for a single nanowire - Theory and application

Author

Wenhua Gu ; Kyekyoon Kim

Author_Institution

Univ. of Illinois at Urbana-Champaign, Urbana

Volume

1

fYear

2006

fDate

22-25 Oct. 2006

Abstract

A new four-contact method is proposed to accurately determine the resistivity of a single nanowire and of other nanostructures. Unlike the conventional four-contact method or two-contact method, the new scheme does not require nonrectifying (Ohmic) contacts to the nanowire, and can completely eliminate the systematic errors resulting from the contact resistance or the resistance difference between the contacts. The present method has been successfully applied to a copper nanowire and can be used as a universal resistivity measurement scheme for all nanowires and other nanostructures.

Keywords

copper; electrical resistivity; nanowires; ohmic contacts; accurate resistivity measurement; contact resistance; copper nanowire; four-contact method; nonrectifying contacts; ohmic contacts; resistance difference; single nanowire; two-contact method; universal resistivity measurement scheme; Application software; Conductivity measurement; Contact resistance; Electrical resistance measurement; Equivalent circuits; Nanostructures; Schottky barriers; Transistors; Voltage; Yarn; four-contact method; nanowire; resitivity;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE

Conference_Location

Gyeongju

Print_ISBN

978-1-4244-0540-4

Type

conf

DOI

10.1109/NMDC.2006.4388875

Filename

4388875