Application of UV nanoimprint lithography in polymer photonic nano-systems

Author

Choi, Choon-Gi ; Han, Young-Tak ; Kim, Jin Tae

Author_Institution

IT Convergence & Components Lab., Electron. & Telecommun. Res. Inst., Daejeon

Volume

1

fYear

2006

fDate

22-25 Oct. 2006

Firstpage

536

Lastpage

537

Abstract

We report an application of UV nanoimprint lithography for the fabrication of two-dimensional polymer photonic crystal slab waveguides. With the aid of optimized resin droplet size and imprint pressure, air-hole photonic crystal structures were replicated on the optical polymer resin. By incorporating buffered oxide etch process, the glass substrate was selectively etched and the imprinted polymer photonic crystal slab waveguides were air-suspended as a membrane. The UV nanoimprinted polymer photonic crystal slab waveguides will be an attractive candidate for the implementations of ultra-compact photonic nano-systems and nano-photonic integrated circuits.

Keywords

nanolithography; nanostructured materials; optical fabrication; optical polymers; photonic crystals; soft lithography; ultraviolet lithography; 2D polymer photonic crystal slab waveguides; UV nanoimprint lithography; air-hole photonic crystal structures; glass substrate; nanophotonic integrated circuits; optical polymer resin; oxide etch process; polymer photonic nanosystems; resin droplet size; Etching; Nanolithography; Optical buffering; Optical device fabrication; Optical polymers; Optical waveguides; Photonic crystals; Photonic integrated circuits; Resins; Slabs; Nano-photonic integrated circuits; Photonic nano-systems; UV nanoimprint lithography; photonic crystals; polymer; slab waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE

Conference_Location

Gyeongju

Print_ISBN

978-1-4244-0540-4

Electronic_ISBN

978-1-4244-0541-1

Type

conf

DOI

10.1109/NMDC.2006.4388890

Filename

4388890