DocumentCode
2215783
Title
Analysis on behaviors of macroparticles in Vacuum Arc Deposition with magnetic field
Author
Zou Jian ; Zhongyuan, Cheng ; Hao, Wang ; Hai, Wang
Author_Institution
Dept. of Electr. Eng., Huazhong Univ. of Sci. & Technol., Hubei, China
Volume
2
fYear
1996
fDate
21-26 Jul 1996
Firstpage
867
Abstract
Macroparticles (MP´s) contamination is one of the questions in Vacuum Arc Deposition (VAD). This paper discusses some MP´s-related theoretical topics such as the initial state at the moment of MP´s ejection, including emission velocity and ejection angle, and their transport behavior in magnetized or unmagnetized VAD plasma
Keywords
magnetic field effects; vacuum deposition; ejection angle; emission velocity; high-tech film preparation; macroparticles; magnetic field; unmagnetized vacuum arc deposition plasma; Cathodes; Coatings; Contamination; Explosives; Magnetic analysis; Magnetic fields; Plasma transport processes; Stress; Vacuum arcs; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location
Berkeley, CA
Print_ISBN
0-7803-2906-6
Type
conf
DOI
10.1109/DEIV.1996.545486
Filename
545486
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