Title :
Analysis on behaviors of macroparticles in Vacuum Arc Deposition with magnetic field
Author :
Zou Jian ; Zhongyuan, Cheng ; Hao, Wang ; Hai, Wang
Author_Institution :
Dept. of Electr. Eng., Huazhong Univ. of Sci. & Technol., Hubei, China
Abstract :
Macroparticles (MP´s) contamination is one of the questions in Vacuum Arc Deposition (VAD). This paper discusses some MP´s-related theoretical topics such as the initial state at the moment of MP´s ejection, including emission velocity and ejection angle, and their transport behavior in magnetized or unmagnetized VAD plasma
Keywords :
magnetic field effects; vacuum deposition; ejection angle; emission velocity; high-tech film preparation; macroparticles; magnetic field; unmagnetized vacuum arc deposition plasma; Cathodes; Coatings; Contamination; Explosives; Magnetic analysis; Magnetic fields; Plasma transport processes; Stress; Vacuum arcs; Vacuum technology;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
DOI :
10.1109/DEIV.1996.545486
