DocumentCode :
2216051
Title :
Physical and technological features of the arc vacuum system for coatings deposition based on the plasma arc accelerator
Author :
Semenyuk, Valeriy ; Osipov, Leonid ; Nyi, Nikolay Svavi´ ; Chernolutskiy, Dmitriy ; Gurin, Anatoliy
Author_Institution :
Design Eng. Enterprise INTRA Ltd., Kyiv, Ukraine
Volume :
2
fYear :
1996
fDate :
21-26 Jul 1996
Firstpage :
871
Abstract :
Here the authors present the results of investigations of the space structure and energy parameters of the plasma flow in the vacuum arc system with the sacrificial cathode in the magnetic field which provides confinement of the arc discharge near the end operating cathode surface and the additional acceleration of the plasma flow towards the processed article as well. As a result, under the operating pressure up to 100 Pa the directed flow of the coating material plasma with the maximum energy of the ion component up to 150 eV and with the flow density up to 20 mA/cm2 is formed. The investigated plasma arc accelerator (PAA) allows to produce the high quality coatings with the diminished micro-drops fraction onto metal, dielectric substrates under operating surface temperatures lower than 450 K using the cathodes from the easily melting materials with melting temperatures lower than 2000 K
Keywords :
magnetic field effects; melting; plasma arc sprayed coatings; plasma arc spraying; vacuum deposited coatings; vacuum deposition; 100 Pa; 150 eV; arc discharge; arc vacuum system; coatings deposition; dielectric substrates; melting temperatures; plasma arc accelerator; plasma flow; vacuum arc system; Cathodes; Plasma accelerators; Plasma confinement; Plasma density; Plasma materials processing; Plasma temperature; Space technology; Vacuum arcs; Vacuum systems; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
Type :
conf
DOI :
10.1109/DEIV.1996.545487
Filename :
545487
Link To Document :
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