The performance improvement of coplanar waveguides by silicon micromachined technology

Author

Yanling, Shi ; Zongsheng, Lai ; Peisheng, Xin ; Ziqiang, Zhu

Author_Institution

Dept. of E.E., East China Normal Univ., Shanghai, China

Volume

2

fYear

2001

fDate

22-25 Oct. 2001

Firstpage

761

Abstract

This article reports the design and fabrication of micromachined microwave transmission lines with suspended structure in terms of the CMOS technology and the post-processing micromachined technology. Samples with 120 Ω of characteristic impedance were fabricated through hybrid etching processes. Measurements were performed on the samples using the automatic network analyzer in a wide range of frequency from 1 to 40GHz. The structures with suspended transmission lines showed significant improvement in transmission attenuation.

Keywords

CMOS integrated circuits; coplanar transmission lines; coplanar waveguides; electric impedance; etching; micromechanical devices; microwave devices; 1 to 40 GHz; 120 ohm; CMOS technology; Si; automatic network analyzer; coplanar waveguides; hybrid etching; impedance; micromachined microwave transmission lines; post-processing micromachined technology; CMOS technology; Coplanar transmission lines; Coplanar waveguides; Etching; Fabrication; Frequency measurement; Impedance; Microwave technology; Silicon; Transmission line measurements;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on

Print_ISBN

0-7803-6520-8

Type

conf

DOI

10.1109/ICSICT.2001.982006

Filename

982006