Vacuum arc deposition of TiN and TiOx films on large metallic and dielectric surfaces

Plasma-assisted vacuum deposition of TiN and TiO_x films is performed using four vacuum arc evaporators and four hot-cathode-arc plasma generators. Film deposition on substrates of total area 6 m² , with the workpiece having dimensions of 1×1.6 m, is completed in one cycle. The arc parameters in the process of film deposition are typically as follows: the vacuum arc current and voltage are 100 A and 30 V, respectively, and the hot-cathode arc current and voltage are 20 A and 50 V, respectively. The deposition of a TiN film on a metal takes 50 min, while the TiN or TiO_x film deposition on a dielectric occurs within 20 min