• DocumentCode
    2216700
  • Title

    Fabrication of micromachined infrared thermopile detector using novel front etch process

  • Author

    Xu, Zhengyi ; Bin Yiong ; Yuelin Wang

  • Author_Institution
    State Key Lab. of Transducer Technol., Acad. Sinica, Shanghai, China
  • Volume
    2
  • fYear
    2001
  • fDate
    22-25 Oct. 2001
  • Firstpage
    797
  • Abstract
    A novel front etch process is developed to remove bulk silicon and leave a thin membrane as the supporting structure in a thermopile detector. Compared with other bulk micromachining processes, our front etch process has advantages in terms of photolithography, reliability and dehydration operation. Using this technology, an infrared thermopile detector was fabricated.
  • Keywords
    etching; infrared detectors; micromachining; microsensors; semiconductor device reliability; thermopiles; Si; Si3N4-SiO2; dehydration operation; front etch process; micromachined infrared thermopile detector fabrication; photolithography; reliability; thin membrane supporting structure; Anisotropic magnetoresistance; Biomembranes; Costs; Dielectric substrates; Fabrication; Infrared detectors; Lithography; Semiconductor thin films; Silicon; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
  • Print_ISBN
    0-7803-6520-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2001.982015
  • Filename
    982015
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2216700