• DocumentCode
    2216706
  • Title

    Reduction of critical current density for spin transfer magnetization switching in a spin-valve nano-pillar

  • Author

    Kang, C.H. ; Lee, J.C. ; Shin, K.H. ; Lim, S.H.

  • Author_Institution
    Korea Univ., Seoul
  • Volume
    1
  • fYear
    2006
  • fDate
    22-25 Oct. 2006
  • Firstpage
    614
  • Lastpage
    615
  • Abstract
    Experimental results on the current induced magnetization switching of nano-patterned IrMn/CoFe/Cu/CoFe spin-valves are reported. The main emphasis is the increase of MR and the reduction of the critical current density through an improved fabrication process. A method using a batch-fabricated trilayer template is developed with the junction features defined by a platinum(Pt) stencil mask. Nano-pillars with the lateral dimensions (150times80 nm2) are fabricated by electron-beam lithography, including a wet etching to form a nanotemplate. A key to the improved fabrication process is the formation of the recessed part of the SiO2 layer which helps to reduce the shadow effect during the deposition of the spin valve multilayers into the nanotemplate. Both the MR ratio and the critical current density are enhanced by the new improved fabrication process. The observed critical current density is 5.98times106 A/cm2, which is significantly smaller than the value of 1.16times108 A/cm2 observed in a similar device fabricated using a conventional fabrication process.
  • Keywords
    cobalt alloys; copper alloys; electron beam lithography; etching; giant magnetoresistance; iridium alloys; iron alloys; magnetic multilayers; magnetic switching; magnetisation; manganese alloys; nanolithography; nanopatterning; spin valves; IrMn-CoFe-Cu-CoFe; IrMn-CoFe-Cu-CoFe - Interface; batch-fabricated trilayer template; critical current density; electron-beam lithography; platinum stencil mask; spin transfer magnetization switching; spin valve multilayers; spin-valve nanopillar; wet etching; Computer integrated manufacturing; Critical current density; Electrodes; Fabrication; Magnetic multilayers; Magnetic switching; Magnetization; Nanoscale devices; Nonhomogeneous media; Wet etching; current-induced magnetization switching; improved fabrication process; spin transfer torque; spin-valve nano-pillar;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
  • Conference_Location
    Gyeongju
  • Print_ISBN
    978-1-4244-0541-1
  • Electronic_ISBN
    978-1-4244-0541-1
  • Type

    conf

  • DOI
    10.1109/NMDC.2006.4388929
  • Filename
    4388929