DocumentCode
2216706
Title
Reduction of critical current density for spin transfer magnetization switching in a spin-valve nano-pillar
Author
Kang, C.H. ; Lee, J.C. ; Shin, K.H. ; Lim, S.H.
Author_Institution
Korea Univ., Seoul
Volume
1
fYear
2006
fDate
22-25 Oct. 2006
Firstpage
614
Lastpage
615
Abstract
Experimental results on the current induced magnetization switching of nano-patterned IrMn/CoFe/Cu/CoFe spin-valves are reported. The main emphasis is the increase of MR and the reduction of the critical current density through an improved fabrication process. A method using a batch-fabricated trilayer template is developed with the junction features defined by a platinum(Pt) stencil mask. Nano-pillars with the lateral dimensions (150times80 nm2) are fabricated by electron-beam lithography, including a wet etching to form a nanotemplate. A key to the improved fabrication process is the formation of the recessed part of the SiO2 layer which helps to reduce the shadow effect during the deposition of the spin valve multilayers into the nanotemplate. Both the MR ratio and the critical current density are enhanced by the new improved fabrication process. The observed critical current density is 5.98times106 A/cm2, which is significantly smaller than the value of 1.16times108 A/cm2 observed in a similar device fabricated using a conventional fabrication process.
Keywords
cobalt alloys; copper alloys; electron beam lithography; etching; giant magnetoresistance; iridium alloys; iron alloys; magnetic multilayers; magnetic switching; magnetisation; manganese alloys; nanolithography; nanopatterning; spin valves; IrMn-CoFe-Cu-CoFe; IrMn-CoFe-Cu-CoFe - Interface; batch-fabricated trilayer template; critical current density; electron-beam lithography; platinum stencil mask; spin transfer magnetization switching; spin valve multilayers; spin-valve nanopillar; wet etching; Computer integrated manufacturing; Critical current density; Electrodes; Fabrication; Magnetic multilayers; Magnetic switching; Magnetization; Nanoscale devices; Nonhomogeneous media; Wet etching; current-induced magnetization switching; improved fabrication process; spin transfer torque; spin-valve nano-pillar;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
Conference_Location
Gyeongju
Print_ISBN
978-1-4244-0541-1
Electronic_ISBN
978-1-4244-0541-1
Type
conf
DOI
10.1109/NMDC.2006.4388929
Filename
4388929
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