DocumentCode :
2217300
Title :
Hole quantization and hole direct tunneling in deep submicron p-MOSFETs
Author :
Hou, Y.T. ; Li, M.-F. ; Jin, Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore
Volume :
2
fYear :
2001
fDate :
22-25 Oct. 2001
Firstpage :
895
Abstract :
Hole quantization is studied by a simple and efficient model based on the six-band effective mass approximation (EMA). Due to the valence band mixing effect, the traditional one-band EMA using effective mass values extracted from bulk Si underestimates the density of states and gives inaccurate results on the energy quantization. Furthermore, an improved one-band EMA, where effective mass values of energy quantization and density of states are empirically determined from the numerical results of six-band EMA (they are 0.29/1.16, 0.23/0.70, 0.23/0.60 m0), is proposed. In addition, its practical application to the modeling of quantum mechanical effects is also justified. Based on the hole quantization and using a Freeman-Dahlke hole dispersion in oxide band gap, the hole direct tunneling (DT) is also calculated and the results are in good agreement with the experiments.
Keywords :
MOSFET; effective mass; electronic density of states; energy gap; semiconductor device models; tunnelling; valence bands; EMA; Freeman-Dahlke hole dispersion; band gap; deep submicron p-MOSFETs; density of states; effective mass; hole direct tunneling; hole quantization; quantum mechanical effects; six-band effective mass approximation; valence band mixing effect; Computer aided manufacturing; Effective mass; Electronic mail; MOSFET circuits; Potential well; Quantization; Semiconductor device manufacture; Silicon; Tunneling; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.982039
Filename :
982039
Link To Document :
بازگشت