Title :
Quasisteady vacuum arc source of energetic ion flows for thin film deposition applications
Author :
Kabantsev, Andrey
Author_Institution :
Budker Inst. of Nucl. Phys., Novosibirsk, Russia
Abstract :
For applications of vacuum arc ion sources (VAIS) to material processing, a quasi-steady large-diameter VAIS with an external axial magnetic field was developed. The metal plasma flow with the ion energy up to several hundreds of eV at the ion current density of about 10 A/cm 2 was obtained. This is effective both for the vacuum arc deposition of rigid films adhering strongly to substrate surfaces and for sputter deposition of target materials
Keywords :
adhesion; ion beam applications; magnetic field effects; vacuum deposited coatings; vacuum deposition; energetic ion flows; external axial magnetic field; metal plasma flow; quasisteady vacuum arc ion source; rigid films adhesion; substrate surfaces; thin film deposition applications; Elementary particle vacuum; Ion sources; Magnetic fields; Materials processing; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Transistors; Vacuum arcs;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
DOI :
10.1109/DEIV.1996.545492
