• DocumentCode
    2217418
  • Title

    High-density optical disk pattern mastering using nanoimprint lithography

  • Author

    Choi, Choon-Gi

  • Author_Institution
    IT Convergence & Components Lab. (ICCL), Electron. & Telecommun. Res. Inst. (ETRI), Daejeon
  • Volume
    1
  • fYear
    2006
  • fDate
    22-25 Oct. 2006
  • Firstpage
    682
  • Lastpage
    683
  • Abstract
    We demonstrated nanoimprint lithography for the high-density optical disk pattern mastering. The nickel electroplated optical disk patterns with pit lengths of ~105 nm, ~ 67 nm, and ~ 40 nm on the nanoimprinted optical disk patterns were successfully fabricated. Because of the advanced technology, it has great possibility that the next generation high-density optical disk will be manufactured by nanoimprint lithography mastering technology.
  • Keywords
    electroplating; nanolithography; optical disc storage; high-density optical disk pattern mastering; nanoimprint lithography; nanoimprinted optical disk patterns; nickel electroplated optical disk patterns; Chromium; Electron beams; Etching; Nanolithography; Nickel; Optical films; Optical scattering; Resists; Silicon; Substrates; disk mastering; electroplating; high-density optical disk; nanoimprint lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2006. NMDC 2006. IEEE
  • Conference_Location
    Gyeongju
  • Print_ISBN
    978-1-4244-0540-4
  • Electronic_ISBN
    978-1-4244-0541-1
  • Type

    conf

  • DOI
    10.1109/NMDC.2006.4388960
  • Filename
    4388960