DocumentCode
2217470
Title
Ka-Band MEMS Switches on CMOS Grade Silicon with a Polyimide Interface Layer
Author
Ponchak, George E. ; Varaljay, Nicholas C. ; Papapolymerou, John
Author_Institution
NASA Glenn Research Center, 21000 Brookpark Rd., MS 54/5, Cleveland, OH 44135
fYear
2003
fDate
Oct. 2003
Firstpage
971
Lastpage
974
Abstract
For the first time, RF MEMS switches on CMOS grade Si with a polyimide interface layer are fabricated and characterized. At Ka-Band (36.6 GHz), an insertion loss of 0.52 dB and an isolation of 20 dB is obtained.
Keywords
CMOS technology; Fabrication; Integrated circuit technology; Microswitches; Microwave circuits; Polyimides; Radio frequency; Radiofrequency microelectromechanical systems; Silicon; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2003 33rd European
Conference_Location
Munich, Germany
Print_ISBN
1-58053-834-7
Type
conf
DOI
10.1109/EUMA.2003.341125
Filename
4143181
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