DocumentCode
2217478
Title
Full-band Monte Carlo simulation for metal-semiconductor contact with direct tunneling effect
Author
Sun, Lei ; Du, Gang ; Liu, Xiaoyan ; Han, Ruqi
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
Volume
2
fYear
2001
fDate
22-25 Oct. 2001
Firstpage
920
Abstract
The metal-semiconductor contact including the quantum mechanical tunneling effect is simulated by the self-consistent ensemble Monte Carlo method. Two-dimension in real space is considered and irregular tetrahedron distribution is used in k-space. A variable G-scheme is used in the self-scattering method. The tunneling currents both under forward and reverse biases are investigated. The results indicate the tunneling effect is of great importance under reverse biases.
Keywords
Monte Carlo methods; Schottky barriers; semiconductor-metal boundaries; tunnelling; direct tunneling effect; forward bias; full-band Monte Carlo simulation; k-space; metal-semiconductor contact; quantum mechanical tunneling effect; reverse bias; self-consistent ensemble Monte Carlo method; self-scattering method; tunneling currents; variable G-scheme; Current density; Electron emission; Microelectronics; Probability; Quantum mechanics; Schottky barriers; Semiconductor-metal interfaces; Sun; Tunneling; Turning;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN
0-7803-6520-8
Type
conf
DOI
10.1109/ICSICT.2001.982045
Filename
982045
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