DocumentCode :
2217668
Title :
Influence Of Bicmos Processing On Thin Gate Oxide Quality
Author :
Whiston, Seamus
Author_Institution :
Rameen Industrial Estate
fYear :
1993
fDate :
24-27 Oct 1993
Firstpage :
229
Lastpage :
233
Keywords :
BiCMOS integrated circuits; Breakdown voltage; Brushes; CMOS process; Capacitors; Design for quality; Inorganic materials; Manufacturing processes; Resistors; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 1993 International
Type :
conf
DOI :
10.1109/IRWS.1993.666322
Filename :
666322
Link To Document :
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