• DocumentCode
    2217931
  • Title

    The effect of high injection on the density of states of silicon

  • Author

    Lowney, Jeremiah R.

  • Author_Institution
    NBS, Gaithersburg, MD, USA
  • fYear
    1988
  • fDate
    12-13 Sep 1988
  • Firstpage
    188
  • Lastpage
    190
  • Abstract
    The effects of high-injection levels on the conduction and valence bands of silicon have been determined according to theory based on first principles. The results show important narrowing of the energy gap by the injected electron-hole plasma as well as a reduction in the dopant-carrier interaction because of a reduction in the free-carrier screening radius. Interestingly, these two effects tend to compensate each other somewhat in heavily doped and heavily injected material. Since the gain of a bipolar device is very sensitive to the bandgap, device models need to include these effects in order to model a device correctly throughout its operating regime
  • Keywords
    bipolar transistors; conduction bands; electronic density of states; elemental semiconductors; energy gap; heavily doped semiconductors; semiconductor device models; silicon; solid-state plasma; valence bands; Si; bipolar device; conduction bands; density of states; device models; dopant-carrier interaction; energy gap; free-carrier screening radius; gain; heavily doped material; high-injection levels; injected electron-hole plasma; operating regime; valence bands; Charge carrier processes; NIST; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Plasma temperature; Silicon; Statistical distributions; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar Circuits and Technology Meeting, 1988., Proceedings of the 1988
  • Conference_Location
    Minneapolis, MN
  • Type

    conf

  • DOI
    10.1109/BIPOL.1988.51075
  • Filename
    51075