Title :
Device engineering for a modular 650 V transistor assortment
Author :
Lerner, Ralf ; Schottmann, Klaus ; Kittler, Gabriel
Author_Institution :
X-FAB Semicond. Foundries AG, Erfurt, Germany
Abstract :
Using a trench isolated 650 V quasi-vertical n-channel DMOS as a starting point several new 650 V transistor types have been evaluated. Mainly by design measures a 650 V depletion DMOS, a 650 V PMOS and a 650 V IGBT were created for a modular integration into the process flow. Design modifications like increased channel length, well constructions and drain modifications were used to create the new devices. Original n-channel DMOS design features like curvatures or field plate constructions have been re-used. Necessary new process steps for the depletion transistor and for the IGBT were kept to minimum additional process effort and use a flexible process approach with independent addable modules.
Keywords :
MOS integrated circuits; insulated gate bipolar transistors; IGBT; channel length; depletion transistor; device engineering; drain modification; field plate constructions; modular 650 V transistor assortment; modular integration; n-channel DMOS design; process flow; trench isolated 650 V quasi-vertical n-channel DMOS; voltage 650 V; Breakdown voltage; Doping; Implants; Insulated gate bipolar transistors; Layout; Logic gates; Transistors; High voltage transistor; SOI; Trench;
Conference_Titel :
Semiconductor Conference Dresden (SCD), 2011
Conference_Location :
Dresden
Print_ISBN :
978-1-4577-0431-4
DOI :
10.1109/SCD.2011.6068713