• DocumentCode
    2218893
  • Title

    Perimeter effect in advanced self-aligned bipolar transistor

  • Author

    Sawada, Shigeki

  • Author_Institution
    Matsushita Electron. Corp., Kyoto, Japan
  • fYear
    1988
  • fDate
    12-13 Sep 1988
  • Firstpage
    206
  • Lastpage
    209
  • Abstract
    Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current
  • Keywords
    bipolar transistors; contact resistance; tunnelling; advanced self-aligned bipolar transistor; base resistance increment; collector emitter punchthrough; cutoff frequency; emitter current crowding; emitter perimeter effects; extrinsic-base profile; extrinsic-intrinsic base overlap; lateral encroachment; sidewall spacer length; sidewall spacer technology; tunneling current; Bipolar integrated circuits; Bipolar transistors; Boron; Frequency; Immune system; Integrated circuit technology; Laboratories; Proximity effect; Sociotechnical systems; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar Circuits and Technology Meeting, 1988., Proceedings of the 1988
  • Conference_Location
    Minneapolis, MN
  • Type

    conf

  • DOI
    10.1109/BIPOL.1988.51080
  • Filename
    51080