Title :
Perimeter effect in advanced self-aligned bipolar transistor
Author_Institution :
Matsushita Electron. Corp., Kyoto, Japan
Abstract :
Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current
Keywords :
bipolar transistors; contact resistance; tunnelling; advanced self-aligned bipolar transistor; base resistance increment; collector emitter punchthrough; cutoff frequency; emitter current crowding; emitter perimeter effects; extrinsic-base profile; extrinsic-intrinsic base overlap; lateral encroachment; sidewall spacer length; sidewall spacer technology; tunneling current; Bipolar integrated circuits; Bipolar transistors; Boron; Frequency; Immune system; Integrated circuit technology; Laboratories; Proximity effect; Sociotechnical systems; Tunneling;
Conference_Titel :
Bipolar Circuits and Technology Meeting, 1988., Proceedings of the 1988
Conference_Location :
Minneapolis, MN
DOI :
10.1109/BIPOL.1988.51080