Optical emission spectroscopy in cathodic arc deposition

Author

Kühn, M. ; Pintaske, R. ; Richter, F.

Author_Institution

Dept. of Phys., Tech. Univ. Chemnitz, Germany

Volume

2

fYear

1996

fDate

21-26 Jul 1996

Firstpage

932

Abstract

In this study emission spectra for Ti+N₂ and Cr+N₂ cathodic arc plasmas with N₂ pressures between 10^-3 and 1 Pa have been detected in the range between 220 and 800 nm. The behaviour of the line intensities of metallic species indicates the importance of ion-molecule collisions. The degree of excitation of the various nitrogen species was characterized by analysis of the population of the vibrational levels. For comparison, similar spectra were taken for Ti and Cr arc discharges with varying argon pressure

Keywords

cathodes; chromium; ion-molecule collisions; plasma collision processes; plasma deposition; spectroscopy; titanium; vacuum arcs; vacuum deposition; 10E-3 to 1 Pa; 220 to 800 nm; Cr arc discharge; Cr+N₂ cathodic arc plasma; Cr-N₂; N₂ pressures; Ti arc discharge; Ti+N₂ cathodic arc plasma; Ti-N₂; argon pressure; cathodic arc deposition; ion-molecule collisions; line intensities behaviour; nitrogen species excitation; optical emission spectroscopy; vacuum arc deposition; vibrational levels population; Cathodes; Dielectrics and electrical insulation; Magnetic heads; Nitrogen; Optical sensors; Probability; Spectroscopy; Stimulated emission; Titanium; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on

Conference_Location

Berkeley, CA

Print_ISBN

0-7803-2906-6

Type

conf

DOI

10.1109/DEIV.1996.545501

Filename

545501