DocumentCode :
2219807
Title :
Ion energy measurements in vacuum arc deposition
Author :
Yang, Lei ; Zou, Jiyan ; Cheng, Zhongyuan ; Liang, Xiuli
Author_Institution :
Dept. of Electr. Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
Volume :
2
fYear :
1996
fDate :
21-26 Jul 1996
Firstpage :
937
Abstract :
This paper introduces a Faraday-cup system used to measure the ion energy in vacuum arc deposition. The pressure and current dependence of the ion energy, as well as its angular distribution are presented. Further, the combined ion parameter Ep is investigated. Under the condition of 100 A, 0.66 Pa, -100 V, the typical maximum ion energy is 75 eV, the value of Ep is 828 eV/atom
Keywords :
energy measurement; ions; plasma deposition; plasma diagnostics; vacuum deposition; -100 V; 0.66 Pa; 100 A; 75 eV; Faraday-cup system; angular distribution; combined ion parameter; current dependence; ion energy measurements; plasma deposition; pressure dependence; vacuum arc deposition; Cathodes; Coatings; Elementary particle vacuum; Energy measurement; Orifices; Plasma diagnostics; Plasma measurements; Plasma properties; Tin; Vacuum arcs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
Type :
conf
DOI :
10.1109/DEIV.1996.545502
Filename :
545502
Link To Document :
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