Deposition of superhard amorphous carbon films by pulsed arc sources

Author

Scheibe, H.-J. ; Schultrich, B. ; Ziegele, H. ; Siemroth, P.

Author_Institution

Fraunhofer-Inst. fur Werkstoffphys. und Schichttechnol., Dresden, Germany

Volume

2

fYear

1996

fDate

21-26 Jul 1996

Firstpage

941

Abstract

Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. By the combination of very high hardness, low adhesion and high smoothness, these films show superior behaviour in wear and glide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed

Keywords

carbon; plasma CVD coatings; thin films; wear resistant coatings; crystalline superhard materials; deposition conditions; film properties; glide applications; high smoothness; hydrogen-free amorphous carbon films; low adhesion; plasma conditions; pulsed arc sources; superhard amorphous carbon films; vacuum deposition; very high hardness; wear applications; Adhesives; Amorphous materials; Coatings; Crystalline materials; Crystallization; Hydrogen; Plasma measurements; Plasma properties; Plasma temperature; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on

Conference_Location

Berkeley, CA

Print_ISBN

0-7803-2906-6

Type

conf

DOI

10.1109/DEIV.1996.545503

Filename

545503