Title :
A model of thin film condensation
Author :
Kostiouk, G.I. ; Levchenko, I.G.
Author_Institution :
Dept. of Physicotechnol. Basis of Structural Mater. Machining, Kharkov Aviation Inst.
Abstract :
A model of thin film condensation have been developed to investigate the film growth regularity and calculate the most important characteristics of thin coating, such as microhardness, roughness, porosity etc. Our model allows calculation of film structure and defines the above-mentioned characteristics. Besides, the model is suitable for calculation of the conditions needed for a film to have a certain structure. The model takes into account all the most important processes on the surface. Some very interesting results were obtained by means of computing experiments
Keywords :
film condensation; microhardness; phase transformations; surface topography; thin films; film structure; microhardness; porosity; roughness; surface processes; thin film condensation model; thin film growth regularity; Adhesives; Atomic measurements; Dielectrics and electrical insulation; Differential equations; Elementary particle vacuum; Lattices; Rough surfaces; Surface discharges; Surface roughness; Transistors;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
DOI :
10.1109/DEIV.1996.545504
