DocumentCode :
2220674
Title :
Nonequilibrium nondissipative thermodynamics - and its application to diamond film deposition
Author :
Wang, Ji-Tao
Author_Institution :
Dept. of Microelectron., Fudan Univ., Shanghai, China
Volume :
2
fYear :
2001
fDate :
22-25 Oct. 2001
Firstpage :
1421
Abstract :
The equality of the 2nd law of thermodynamics had been regarded as the sufficient and necessary condition for a system being in equilibrium for about 150 years. However, such a classical or traditional basic concept should be overthrown or changed for complex systems including nonspontaneous reaction(s). Therefore, a new field of nonequilibrium nondissipative thermodynamics has been introduced by the author into a complete systematization of modem thermodynamics. Nonequilibrium nondissipative thermodynamics provides a solid theoretical base for quantitative calculation of nonequilibrium phase diagrams. A series of calculated nonequilibrium phase diagrams for activated low pressure diamond films deposition agree excellently with a great number of experimental data reported in the literature. Nonequilibrium nondissipative thermodynamics and the nonequilibrium phase diagram theorem can also be used for cubic boron nitride deposition and other solid-state and integrated circuit technology.
Keywords :
CVD coatings; diamond; nonequilibrium thermodynamics; phase diagrams; BN; C; CVD; cubic boron nitride deposition; diamond film deposition; nonequilibrium nondissipative thermodynamics; nonequilibrium phase diagrams; second law of thermodynamics; Application specific integrated circuits; Books; Chemical technology; Entropy; Heat engines; Isobaric; Isothermal processes; Modems; Solids; Thermodynamics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.982170
Filename :
982170
Link To Document :
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