DocumentCode :
2220826
Title :
Energy transfer in Er doped silica films containing Si nanocrystals formed by MEVVA ion implantation
Author :
Xiao, Zhisong ; Xu, Fei ; Zhang, Tonghe ; Cheng, Guoan ; Gu, Lanlan ; Wong, S.P.
Author_Institution :
Dept. of Electron. Eng., Chinese Univ. of Hong Kong, Shatin, China
Volume :
2
fYear :
2001
fDate :
22-25 Oct. 2001
Firstpage :
1456
Abstract :
Er-doped SiO2 thin films containing Si nanocrystals (nc-si) were prepared by a metal vapor vacuum arc (MEVVA) ion source and their photoluminescence (PL) properties were studied. 1.54 μm light emission from the samples could be assigned to the Er3+ optical transmission from the first excited state (4I132/) to the ground state (4I152/). Correlation between the intensity of the 1.54 μm luminescence peaks was studied as functions of nc-Si concentration and temperature, respectively. The present results clearly demonstrate that the excitation of Er3+ occurs through the recombination of photogenerated carriers outside the nc-Si or at the interface of the nc-Si and SiO2.
Keywords :
erbium; excited states; ion implantation; nanoparticles; optical films; optical materials; photoluminescence; radiative lifetimes; silicon; silicon compounds; spectral line intensity; vacuum deposited coatings; 1.54 micron; Er doped silica films; Er3+ optical transmission; MEVVA ion implantation; PL; Si nanocrystals; SiO2-Si; SiO2:Er-Si; energy transfer; first excited state; ground state; luminescence peak intensity; metal vapor vacuum arc ion implantation; nc-Si concentration effects; photogenerated carrier recombination; photoluminescence; temperature effects; Energy exchange; Erbium; Ion implantation; Ion sources; Nanocrystals; Optical films; Semiconductor films; Semiconductor thin films; Silicon compounds; Vacuum arcs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Print_ISBN :
0-7803-6520-8
Type :
conf
DOI :
10.1109/ICSICT.2001.982178
Filename :
982178
Link To Document :
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