DocumentCode :
2220854
Title :
Reactive gas-controlled arc process
Author :
Rogozin, A.F. ; Fontana, R.P.
Author_Institution :
Multi-Arc Inc., Rockaway, NJ, USA
Volume :
2
fYear :
1996
fDate :
21-26 Jul 1996
Firstpage :
957
Abstract :
There are many methods of particle reduction in the cathodic vacuum arc deposition process: film deposition by filtered arc, magnetic steering. Unfortunately, they are rather complicated and almost not practical for industrial application. We would like to suggest a method to reduce macroparticles, increase the deposition rate and improve the coating quality. This method is based on creation of emission-active phases on the cathode surface and changing the melting point of surface layers of the cathode material and its work function. A comparison of coating smoothness, deposition rate, micro hardness and adhesion between reactive gas controlled arc (RGCA) and the regular process was made. Optical emission spectroscopy was used for investigation of changes in the plasma generation process
Keywords :
Auger effect; adhesion; cathodes; electron spectroscopy; melting point; microhardness; plasma deposited coatings; plasma deposition; plasma production; vacuum deposited coatings; vacuum deposition; Auger electron spectroscopy; adhesion; cathode surface; cathodic vacuum arc deposition process; coating quality improvement; coating smoothness; deposition rate increase; emission-active phases; film deposition; filtered arc; macroparticles reduction; magnetic steering; micro hardness; optical emission spectroscopy; plasma generation process; reactive gas-controlled arc process; surface layers melting point; work function; Adhesives; Cathodes; Coatings; Magnetic films; Magnetic separation; Optical films; Optical materials; Phase change materials; Stimulated emission; Vacuum arcs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
Type :
conf
DOI :
10.1109/DEIV.1996.545506
Filename :
545506
Link To Document :
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