DocumentCode :
2223787
Title :
Development of a single ion detection system for the implantation of donors with nanoscale precision
Author :
Hopf, T. ; Yang, C. ; Jamieson, D.N. ; Tamanyan, G. ; Andresen, S.E. ; Gauja, E. ; Dzurak, A.S. ; Clark, R.G.
Author_Institution :
Sch. of Phys., Melbourne Univ., Vic.
fYear :
2006
fDate :
3-7 July 2006
Abstract :
The authors have developed a technique which enables the implantation and detection of single low-energy (<15 kev) ions in a silicon substrate with nanoscale precision, and with a detection efficiency approaching 100%. The process is based on the collection of electron-hole pairs generated in the substrate by the ion impacts, and is currently being utilized for the construction of prototype quantum computer devices in the solid state.
Keywords :
doping; ion implantation; quantum computing; silicon; IBIC; donor implantation; doping; electron-hole pairs; ion impacts; ion implantation; nanoscale precision; quantum computing; silicon substrate; single ion detection system; single low-energy ions; Aluminum; Australia; Detectors; Doping; Electrodes; Physics computing; Quantum computing; Silicon; Solid state circuits; Telecommunication computing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location :
Brisbane, Qld.
Print_ISBN :
1-4244-0452-5
Electronic_ISBN :
1-4244-0452-5
Type :
conf
DOI :
10.1109/ICONN.2006.340679
Filename :
4143459
Link To Document :
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