DocumentCode
2223830
Title
Establishing an X-Ray Lithography capability at CSIRO
Author
Altissimo, Matteo ; Wilkins, Steve
Author_Institution
CSIRO Manuf. & Infrastructure Technol., Clayton, Vic.
fYear
2006
fDate
3-7 July 2006
Abstract
The construction of the Australian synchrotron provides a unique opportunity to exploit many exciting fields of science, including the possibility to fabricate objects by means of soft X-ray lithography (XRL). Soft XRL is able to faithfully replicate objects with critical sizes down to few tens of nanometers, with high accuracy and high throughput. Furthermore, the fabrication of soft XRL mask is a one-step process, which compares against the two- or three- steps process needed for LIGA masks. This work reports on the developments carried out at CSIRO Manufacturing and Infrastructure Technology in terms of XRL mask fabrication technology by means of electron beam lithography. These masks have been field-tested on the LILIT beamline, Elettra Synchrotron Light Source (Italy). The design of a soft-XRL beamline for the Australian synchrotron is also presented
Keywords
X-ray lithography; electron beam lithography; masks; nanotechnology; synchrotrons; Australian synchrotron; CSIRO; Elettra Synchrotron Light Source; Italy; LIGA masks; LILIT beamline; electron beam lithography; mask fabrication technology; soft X-ray lithography; Australia; Biomembranes; Fabrication; Gold; Manufacturing; Resists; Silicon; Synchrotrons; Writing; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoscience and Nanotechnology, 2006. ICONN '06. International Conference on
Conference_Location
Brisbane, Qld.
Print_ISBN
1-4244-0453-3
Electronic_ISBN
1-4244-0453-3
Type
conf
DOI
10.1109/ICONN.2006.340681
Filename
4143461
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