The selection and creation of the rules in rules-based optical proximity correction

Author

Shi, Rui ; Cai, Yici ; Hong, Xianlong ; Wu, Weimin ; Yang, Changqi

Author_Institution

Tsinghua Univ., Beijing, China

fYear

2001

fDate

2001

Firstpage

50

Lastpage

53

Abstract

Considering the efficiency and veracity of rules-based OPC applied to recent large-scale layout, we firstly point out the importance of the selection and creation of rules in rules-based OPC. Our discussion addresses the crucial factors in selecting and creating rules as well as how we select and create more concise and practical rules-base. Based on our ideas we suggest four primary rules and as a result we show some rule data in table. The automatic construction of the rules-base called OPCL is an important part of the whole rules-based OPC software

Keywords

circuit layout CAD; integrated circuit layout; photolithography; proximity effect (lithography); automatic construction; large-scale layout; optical lithography; rules creation; rules selection; rules-based OPC software; rules-based optical proximity correction; semiconductor manufacturing; semiconductor wafer; Costs; Geometrical optics; Integrated circuit layout; Large-scale systems; Lithography; Proximity effect; Robustness; Semiconductor device manufacture; Semiconductor device modeling; Shape;

fLanguage

English

Publisher

ieee

Conference_Titel

ASIC, 2001. Proceedings. 4th International Conference on

Conference_Location

Shanghai

Print_ISBN

0-7803-6677-8

Type

conf

DOI

10.1109/ICASIC.2001.982496

Filename

982496