DocumentCode :
22244
Title :
Critical Current Properties of FF-MOD RE123 Thin Films Sintered for Short Time
Author :
Ishiwata, Youichi ; Shimoyama, Jun-ichi ; Motoki, T. ; Kishio, Kohji ; Nagaishi, T.
Author_Institution :
Dept. of Appl. Chem., Univ. of Tokyo, Tokyo, Japan
Volume :
23
Issue :
3
fYear :
2013
fDate :
Jun-13
Firstpage :
7500804
Lastpage :
7500804
Abstract :
Optimizations of sintering conditions, such as PO2 , temperature and time, and the introduction of effective pinning centers were systematically studied to improve the critical current properties of RE123 thin films prepared by fluorine-free (FF) metal organic decomposition (MOD) method. We found that epitaxial growth of Y123 in FF-MOD is extremely fast. Effects of dilute Ga doping, RE mixing, and introduction of BaHfO3 fine particles on flux pinning properties were examined. Dilute Ga doping enhanced Jc at low temperature in high magnetic field regardless of sintering conditions, while BaHfO3 precipitates improved Jc at 77 K. In addition, introduction of undoped Y123 seed layer was found to dramatically improve crystallinity of doped or RE-mixed films. Moreover, high epitaxial growth rate of RE123 was maintained for these films.
Keywords :
barium compounds; critical current density (superconductivity); dysprosium compounds; epitaxial growth; flux pinning; gallium compounds; hafnium compounds; high-temperature superconductors; mixing; precipitation; sintering; superconducting epitaxial layers; yttrium compounds; FF-MOD RE123; Y123; Y0.98Ba2Cu3GazOy; Y0.98Ba2Cu3HfzOy; Y1-xDyxBa2Cu3Oy; YBCO; critical current properties; crystallinity; dilute doping; epitaxial growth; fluorine-free metal organic decomposition; flux pinning; magnetic field; mixing; pinning centers; precipitation; sintering; temperature 77 K; thin films; Conductors; Critical current; Doping; Epitaxial growth; Hafnium; Magnetic fields; Coated conductors; fluorine-free metal organic decomposition (MOD); flux pinning;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2012.2237531
Filename :
6416938
Link To Document :
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